Description:This book focuses on the creative use of chemistry in the fabrication of a variety of oxide and non-oxide materials which are likely to play a crucial role in the development of the next generation of microelectronics devices. It includes inorganic precursor chemistry, gas-phase and solid-state chemistry, materials science, chemical physics and chemical engineering. Highlights include the deposition of high-k dielectric gate oxides, ferroelectric oxide films for infrared and memory applications, low-k dielectrics, TiN and TaN diffusion barriers, and fresh precursors for III-V nitrides. The emphasis is on chemical methods for the controlled deposition of thin films, for which chemical vapor deposition (CVD) has proven to be a useful and versatile technique. Of particular interest is the use of liquid-injection MOCVD for the deposition of oxide multilayers and superlattices. Solution deposition techniques such as sol-gel, metalorganic decomposition (MOD), hydrothermal processing are also prominently featured. Topics include: CVD of oxide ceramics; CVD of nonoxide ceramics; solution deposition of electronic ceramics; alternative chemical processing methods and characterization of electronic ceramics..We have made it easy for you to find a PDF Ebooks without any digging. And by having access to our ebooks online or by storing it on your computer, you have convenient answers with Chemical Processing of Dielectrics, Insulators and Electronic Ceramics: Volume 606 (MRS Proceedings). To get started finding Chemical Processing of Dielectrics, Insulators and Electronic Ceramics: Volume 606 (MRS Proceedings), you are right to find our website which has a comprehensive collection of manuals listed. Our library is the biggest of these that have literally hundreds of thousands of different products represented.
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Chemical Processing of Dielectrics, Insulators and Electronic Ceramics: Volume 606 (MRS Proceedings)
Description: This book focuses on the creative use of chemistry in the fabrication of a variety of oxide and non-oxide materials which are likely to play a crucial role in the development of the next generation of microelectronics devices. It includes inorganic precursor chemistry, gas-phase and solid-state chemistry, materials science, chemical physics and chemical engineering. Highlights include the deposition of high-k dielectric gate oxides, ferroelectric oxide films for infrared and memory applications, low-k dielectrics, TiN and TaN diffusion barriers, and fresh precursors for III-V nitrides. The emphasis is on chemical methods for the controlled deposition of thin films, for which chemical vapor deposition (CVD) has proven to be a useful and versatile technique. Of particular interest is the use of liquid-injection MOCVD for the deposition of oxide multilayers and superlattices. Solution deposition techniques such as sol-gel, metalorganic decomposition (MOD), hydrothermal processing are also prominently featured. Topics include: CVD of oxide ceramics; CVD of nonoxide ceramics; solution deposition of electronic ceramics; alternative chemical processing methods and characterization of electronic ceramics..We have made it easy for you to find a PDF Ebooks without any digging. And by having access to our ebooks online or by storing it on your computer, you have convenient answers with Chemical Processing of Dielectrics, Insulators and Electronic Ceramics: Volume 606 (MRS Proceedings). To get started finding Chemical Processing of Dielectrics, Insulators and Electronic Ceramics: Volume 606 (MRS Proceedings), you are right to find our website which has a comprehensive collection of manuals listed. Our library is the biggest of these that have literally hundreds of thousands of different products represented.